Novacon™ & Novacise™ series filters

• Cobetter Nova-series are especially designed for acids, bases and other process chemicals as a cost-effective alternative for wet etch and clean applications where low temperature is required.
• The asymmetric PES membrane provides significant retention of particles with additional characteristics including high flow rates, high dirt holding capacity, and longer filter lifetime.
• In addition, the membrane structure reduces bubbles formation during flow. These filters have high mechanical strength and are suitable for a wide variety of filtration processes.

Chemphobic™ & Chemrapid™ series filters

• The PTFE membrane ensures excellent chemical compatibility with consistent particles removal capability for a wide range of acids, bases and other process chemicals.
• All fluorine construction greatly reduces metal extractables and other contaminants and provides high flow rates and extended service life to meet your needs.

Chemvast™ series filters

• Chemvast filter is available in three kinds of PTFE membranes including hydrophobic PTFE, hydrophilic PTFE or modified PTFE.
• With a HDPE cage and support, the filter has strong chemical compatibility for most semiconductor process chemistries applications. It effectively removes particles from high purity chemicals in the semiconductor industry. Available in a wide range of retention ratings and pore sizes to meet most customer’s requirements.
• Modified PTFE increases the surface energy of the membrane and ensures high flow rates and filtration efficiency, but lower cost than all-fluoropolymer Chemrapid filters.

Photopex™ PE series filters

• Photopex PE filter uses PE membrane, with excellent retention capability, rating from 1nm to 0.2μm, a good choice for advanced photolithography process.
• Its high chemical compatibility can meet most critical demands in semiconductor process. What’s more, it can greatly reduce photochemical waste by providing quick start up and suppress bubble generation.

Photopex™ Nylon Series Filters

• Photopex Nylon filter uses hydrophilic nylon 66 membrane, with HDPE or PP support and hardware, which allows spontaneous wettability. It can greatly reduce photochemical waste by providing quick start up and suppressing bubble generation.
• It is able to filter photoresist, developers and other chemicals in semiconductor processes, with high flow rate performance, outstanding retention capabilities and cleanliness.

IonGard™ SL Purifier

• IonGard SL purifier has been specially designed for the removal of metal ion contaminants from photoresists and high purity solvents.
• By modifying the ion exchange groups on the surface of membrane, the IonGard SL purifier provides a fast and effective metal ions removal capability in various solvents and solvent resin mixtures.
• Manufactured in clean room with high cleanliness level. Promotes fast startups and high yields at low and elevated temperature.

Chemdeion™ Purifier

• Chemdeion Purifier has been specifically designed for the removal of metal contaminants in IPA critical cleaning applications.
• The high retentive PTFE membrane and The high retentive PTFE membrane and the highly clean PFA material of Chemdeion Purifier guarantee high initial cleanliness and high thermal stability.
• With a high ion exchange capacity and high retention rating PTFE membrane, the Chemdeion Purifier can meet the requirement of lowest metal ions and particles contamination in critical IPA application at the highly demanding technology nodes.

Keevalid™ Series CMP Filter

• Keevalid CMP filters are an ideal choice for critical polishing where highly efficient removal of defect causing large particles is needed. The continuously graded structure removes defect causing particles while not changing the slurry manufacturer's mean particle size and distribution.
• Cartridges and capsules come in a wide range of pore sizes, making them suitable for extending the life of downstream on-tool filters or as the final defect reducing solution just before slurry is dispensed.

Pleavalid™ Series CMP Filter

• Pleavalid pleated CMP filters are well suited for higher solids slurries and those which may be more prone to agglomerations. Both cartridges and capsules are available in a wide range of pore sizes.
• The pleated structure provide more surface area which increases service life and reduces filter change outs.

Photogile™ OTTII POU Filters

• Photogile OTTII point-of-use (POU) liquid photochemical filters provide high purity filtration solutions for photolithography processes.
• The compact disposable design saves space and ensures faster startup through quickly connect with manifold, to reduce exposure to process chemicals.

Photogile™ PXOTT POU Filters

• The Photogile PXOTT seires filter is designed for point-of-use photochemical dispense applications, consisting of a head manifold interface and an HDPE capsule filter.
• Various membrane options, such as UPE, Nylon and PTFE, enable PXOTT series filters to compatible with wide range of photochemical.

Fluorolink™ All Fluoropolymer Filter Housing

• Overall PFA construction makes it suitable for highly corrosive high temperature ultra-pure chemicals
• Cobetter Fluorolink all fluoropolymer housing ensures excellent chemical compatibility for a wide range acids, bases and other process chemicals. All fluorine construction can reduce metal extractables and other contaminants.

Gasfender™ Ultra-pure N-Type Gas Filter

Gasfender series is a very good choice for ultrapure gas system, with removal rating at 0.003μm. Recommended for semiconductor process, these filters offer excellent compatibility with all classes of process gases, with good performance no matter at room temperature or high temperature.

• Provide excellent high efficiency filtration and excellent compatibility
• Ensure filters clean, good performance
• 100% helium leak test and 100% integrity test
• Compact design to ensure easily install

Etchclean® filters

• NexPore Etchclean filters are applicable for dilute HF and BOE cleaning filtration applications using inherently hydrophilic, highly-asymmetric polyethersulfone (PES) membranes.
• The high asymmetric membrane structure of our Etchclean filter delivers superior flow rates and throughput while providing absolute-particle retention. These filters last longer and retain more contaminants than most filter suppliers.
• Our Etchclean PES membrane is a mechanically strong membrane and is resistive to a broad range of aqueous solvents.
• The Etchclean filter is the filter of choice for DHF and BOE cleaning applications with very low metal ion extractables , as low as 20 ppb in total where the Φ83mm/10” sample was soaked in 5%, 1500ml HCl for 24 hrs.

Fluorolux® filters

• Nexpore Fluorolux filter cartridges are made entirely from fluoroplastic that can withstand the harshest process conditions due to the virtually indestructible material. Providing broad chemical compatibility, you can count on these filters to produce consistent, uniform process streams in your most demanding filtration applications.
• The hardware PFA 440HP contains no additives and is designed for hostile chemical environments where purity in the parts-per-billion range is needed. The additional benefits may include enhanced purity, improved thermal stability, and chemical inertness to nearly all industrial chemicals and solvents.
• The unlaminated hydrophilic & hydrophobic PTFE filter media are compatible with strong acids, aggressive solvents and high temperatures. These filters are ideal for applications requiring stringent temperatures or chemicals without adding particulates to the filtrate.
• The Flourolux filter is post-treated, purified to be with extremely low metal ion extractables , as low as < 10 ppb in total where the od83mm/10” sample was soaked in 5%, 1500ml HCl for 72 hrs.

Accupor® Series Filters

• The NexPore innovative UPE filter media is built into a pleated cartridge and is permanently fuse bonded inside the base of the capsule. These high-purity UPE capsules combine state-of-the-art materials and design engineering to provide the finest and efficient filtration.
• These capsules are constructed of an ultra-high molecular weight polyethylene (UPE) microporous membrane along with the high-purity HDPE components. Since almost all possible organic substances and metal ions have entirely been removed by specific cleaning procedures from the filter assembly, the highest level of filter cleanliness was reached.
• Since UPE filters do not require prewetting with solvent-based photo-chemicals, the operation cost is lowered and the filtration results are more consistent and reliable.

Fluolux II filters

• TNexpore Fluolux II capsule filters are made entirely from fluoropolymer that can withstand the harshest process conditions due to the virtually indestructible material. Providing broad chemical compatibility, you can count on these filters to produce consistent, uniform process streams in your most demanding filtration applications.
• The hardware PFA 440HP contains no additives and is designed for hostile chemical environments where purity in the parts-per-billion range is needed. Examples are in the semiconductor manufacture, fluid handling systems for industry of life sciences. The additional benefits may include enhanced purity, improved thermal stability, and chemical inertness to nearly all industrial chemicals and solvents.
• The Gore-Tex PTFE filter media are compatible with strong acids, aggressive solvents and high temperatures. These filters are ideal for applications requiring stringent temperatures or chemicals without adding particulates to the filtrate.

Compact Inline Capsules

• Newly developed, low hold-up volume and ready-to-use pressure filtration units offering maximum convenience and performance for the color photochemical filtration. Easy and rapid filter change-out with no tools!
• The CIC filters are constructed of an polytetrafluoroethylene microporous membrane that delivers superior flow rates and throughput while providing absolute-particle retention. The inner filters provide low initial delta P while filtering the color photoresist. These disposable capsules are precision separation products designed, constructed, and tested to provide reliable, consistent performance.
• These capsules provide cost-effective performance for color photoresist filtration applications. They last longer and retain more contaminants than competitive membrane media products.